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Polyvinylpyrrolidone Hybrid Photoresist for Two-color Sensitive Direct Laser Writing
Research Article | 更新时间:2024-10-08
    • Polyvinylpyrrolidone Hybrid Photoresist for Two-color Sensitive Direct Laser Writing

    • ACTA POLYMERICA SINICA   Vol. 53, Issue 6, Pages: 608-616(2022)
    • 作者机构:

      1.之江实验室 交叉创新研究院 智能芯片与器件研究中心 杭州 311121

      2.中国科学院化学研究所 绿色印刷重点实验室 北京分子科学国家研究中心 北京 100190

      3.浙江大学光电科学与工程学院 杭州 310027

    • 作者简介:

      Chun Cao, E-mail: caochun@iccas.ac.cn

      Cui-fang Kuang, E-mail: cfkuang@zju.edu.cn

    • DOI:10.11777/j.issn1000-3304.2021.21323    

      CLC:
    • Published:20 June 2022

      Published Online:14 January 2022

      Received:28 October 2021

      Accepted:14 December 2021

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  • Cao Chun,Qiu Yi-wei,Liu Jian-ting,et al.Polyvinylpyrrolidone Hybrid Photoresist for Two-color Sensitive Direct Laser Writing[J].ACTA POLYMERICA SINICA,2022,53(06):608-616. DOI: 10.11777/j.issn1000-3304.2021.21323.

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