A novel method for the patterning deposition of conducting polyaniline (PAn) on a transparency substrate was presented．A picture or a drawing was printed on a transparent film by a standard laser printer．and PAn was in-situ polymerized on it for three times．Then the transparency was souicated in toluene or benzene for 20s

the printed part was removed and a dupe reverse pattern appeared．In order to investigate the capability of patterning deposition

a dupe reversal of a laser printed photo Was produced

which was more difficult than line patterning (LP)．It showed that the detmlsofthe original photo werereproduced．althoughthe contrast was not so perfect duetothetransparence of the PAn film．It meant that the in-sau polymerization of PAn could produce rather complicated and delicate patterns

and was prospective to apply in the manufacturing of organic electronics

especially for some disposable plastics/papor electronics．The effect of HClO4

HCl and toluenesuffonate dopants on the quality of PAn film was studied．