We examined the polyvinylcabazol (PVK) with diazide as a deep UV resist and found the sensitivity of PVK is markedly increased by adding a small amount of diazide. The sensitivity of PVK containing 5% of diazide is about 30 times more sensitive than the PVK resist itself exposed to UV disinfect lamp. A practical exposure times 7 s was achieved for PVK-diazide

whereas exposure times of 210 s was required for PVK. The high sensitivity of PVK-diazide is mainly attributed to photosensitive crosslinking action of diazide. Images of 1.0μm lines of the pattern are obtained from the deep UV contact exposure.