The polystyrene (PS) substrates were treated by the plasma at different time (0.5

1

3

6

15

30 and 60 minutes) and power (10

20

60

100

150 W) in the Ar

N2

O2

H2 and air.The surface compositions

structure and states of the polystyrene are characterized by X-ray photoelectron spectroscopy (XPS)We have found that large amounts of O and N atoms as new structure are incorporated into the polymer surface by the plasma treatment.We have observed that functional groups

such as C-O

C-NH2 C=O

COOH and O- C - O-O were introduced to surface of polystyrene under these conditions. The depth profiling can be accomplished by controlled erosion of the surface Ar+ sputtering. The shake-up stallite peak (291.7eV) for the polystyrene can again be present after Ar+ sputtering 60 A.