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纸质出版日期:2008-1-20,
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肖继君, 早川晃镜, 柿本雅明. 末端化聚酰胺和交联剂及光酸产生剂所组成的三元负型光敏支化聚酰胺[J]. 高分子学报, 2008,(1):1-7.
XIAO Jijun, HAYAKAWA Teruaki, KAKIMOTO Masa aki. END-MODIFIED POLYAMIDE/PHOTOACID GENERATOR/CROSSLINKER/THREECOMPONENT NEGATIVETYPE PHOTOSENSITIVE BRANCHED POLYAMIDE[J]. Acta Polymerica Sinica, 2008,(1):1-7.
肖继君, 早川晃镜, 柿本雅明. 末端化聚酰胺和交联剂及光酸产生剂所组成的三元负型光敏支化聚酰胺[J]. 高分子学报, 2008,(1):1-7. DOI: 10.3724/SP.J.1105.2008.00001.
XIAO Jijun, HAYAKAWA Teruaki, KAKIMOTO Masa aki. END-MODIFIED POLYAMIDE/PHOTOACID GENERATOR/CROSSLINKER/THREECOMPONENT NEGATIVETYPE PHOTOSENSITIVE BRANCHED POLYAMIDE[J]. Acta Polymerica Sinica, 2008,(1):1-7. DOI: 10.3724/SP.J.1105.2008.00001.
研究了由未端化支化聚酰胺、交联剂(MBHP)和光酸产生剂(PTMA)所组成的三元负型光敏聚合物体系. 其中
不对称ABB′型单体4-(2
4-二氨基苯氧基)苯甲酸3在亚磷酸三苯酯(TPP)和吡啶(Py)的存在下
通过缩合聚合得到支化聚酰胺a
由其1H-NMR 数据计算得支化度(DB)为0.36 接着用肉桂酰氯对支化聚酰胺进行末端化. 采用IR
1H-NMR
GPC
TG/DTA对支化聚酰胺和末端化支化聚酰胺b的结构和性能进行了表征. 由85 wt%末端化支化聚酰胺b、10 wt%交联剂(MBHP)和5 wt%光酸产生剂(PTMA)所组成的光敏聚合物体系
在100℃预烘10 min
采用436 nm (g-line)紫外光曝光
随后在25℃于二甲基甲酰胺中显影10s
用水漂洗
110℃后烘3 min后
得到负型图案
边界清晰且分辨率达40μm.
A three-component negative-type photosensitive branched polyamide based on an endmodified polyamide b
4
4′-methylenebis[2
6-bis(hydroxymethyl)phenol](MBHP) as a cross-linker and a photoacid generator(5-propylulfonyloxyimino-5H-thiophen-2-ylidene)-2-(methylphenyl)acetonitrile(PTMA) has been developed.The polymer b was prepared from a branched polyamide a having degree of branching of 0.36 and cinnamyl chloride
while polymer a was sythesized from an ABB' type monomer
4-(2
4-diaminophenoxy)benzoic acid 3 in the presence of triphenyl phosphite/pyridine (TPP/Py) as a condensing agent.3 was prepared in three steps starting from the displacement of 4-hydroxybenzoic acid methyl ester with 2
4-dinitrofluorobenzene in the presence of potassium carbonate
the nitro groups of 4-(2
4-dinitrophenoxy) benzoic acid methyl ester 1 were reduced to amino groups by hydrogenation in ethyl acetate
and subsequent alkaline hydrolysis of the resulting 4-(2
4-diaminophenoxy) benzoic acid methyl ester 2.In order to avoid the effect of polymer a with amino groups on the subsequent reaction (light crosslinking) of the branched polymer
the end-modification of the amino groups was carried out by using cinnamyl chloride 5.Prior to the endmodification of polymers
the reaction of aniline 4 and 5 for determining whether the desired model compound 6 was formed in quantitative yield to constitute a polymer-forming reaction and to confirm the structure of polymers was studied.The end-modification reactions of polymer b was performed based on the reaction conditions of the model compound above described.Followed by end-modified polymer b with cinnamoyl was successfully prepared with cinnamyl chloride.The monomer 3
model compound 6 and the polymers were characterized by 1H-NMR
The average molecular weights of the polymers were determined by gel permeation chromatography(GPC).The thermal stability of the polymers was measured by thermogravimetric analysis (TGA) under a nitrogen atmosphere.The findings show that the monomer 3 and model compound 6 were successfully synthesized.Degree of branching of branched polyamide a was 0.36
caculationed from 1H-NMR
according to the definition of degree of branching given by Frey.Inherent viscosities (ηinh)
weight-average molecular weight (Mw)and polydispersity(Mw/Mn)of polymer a and b were 0.39 dL/g
0.64 dL/g
7.49×104 and 1.31×105
1.88 and 3.5
respectively.Thermogravimetric analysis (TGA) was used to measure the thermal stability of the polymers
5% weight loss temperature (Td5) of polymer a was observed at 356℃
which is higher than that of polymer b (356℃).The difference in TGA traces may be caused by the terminal cinnamoyl groups.Almost resulting polyamide a and end-capping polyamide b showed excellent solubility and readily dissolved in various solvents such as N-methyl-2-pyrrolidinone (NMP)
N
N′-dimethylacetamide (DMAc)
N
N′-dimethylformamide (DMF). The photosensitive polymer containing polymer b (85 wt%)
MBHP (10 wt%) and PTMA (5 wt%) showed a clear negative image featuring 40 μm line and space pattern when it was pre-baked at 100℃ for 10 min
subsequently exposed to a 436 nm light (g-line) and developed with a developer of DMF at 25℃ for 10 s
rinsed with water (H-2O)
post-baked at 110℃ for 3 min.
负型光敏聚合物支化聚合物支化度肉桂酰氯
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