Wen-qin Zhu, Fan Chen, Rui Wang, Hui-juan Liu, Xin Lin, Jue Cheng, Jun-ying Zhang. The Thermal Oxidative Aging Mechanism of Octavinyl-POSS at Low Temperature (180 ℃) in the N2 Atmosphere with Low Oxygen Concentration[J]. Acta Polymerica Sinica, 2015,(1):25-30.
Wen-qin Zhu, Fan Chen, Rui Wang, Hui-juan Liu, Xin Lin, Jue Cheng, Jun-ying Zhang. The Thermal Oxidative Aging Mechanism of Octavinyl-POSS at Low Temperature (180 ℃) in the N2 Atmosphere with Low Oxygen Concentration[J]. Acta Polymerica Sinica, 2015,(1):25-30. DOI: 10.11777/j.issn1000-3304.2015.14163.
The thermal oxidative aging process of octavinyl-polyhedral oligomeric silsesquioxane (OVPOSS) heated at 180 ℃ in the N2 atmosphere with low oxygen concentration was investigated by series of instrumental analyses.1H-NMR
13C-NMR
29Si-NMR were used to analyze the molecular structure before and after this process
while FTIR
MALDI-TOF
ESR
TG-IR
DSC were used to monitor the changes of characteristic groups
molecular weight
active species
mass loss and enthalpy.The method of aging process in the N2 atmosphere with low oxygen concentration would decrease peroxidatic reaction of the double bonds
only to clarify other mechanisms in this process.The experimental results indicated that the double bonds transformed to single bond in this process and C free radical center was verified
as well as the exothermic efficiency
little weight loss and increasing of molecular weight.The conclusion was drawn that the free-radical polymerization exists in thermal oxidative aging process of OVPOSS at low temperature (180 ℃) in the N2 atmosphere with low oxygen concentration.This research may enrich the thermal oxidative aging theory of polyvinylsiloxane.