掩膜诱导的光敏性三组分聚合物混合体系的自组装

李志海; 潘俊星; 张进军; 孙敏娜; 郭宇琦; 岑建勇; 武海顺

doi:10.11777/j.issn1000-3304.2017.16270

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掩膜诱导的光敏性三组分聚合物混合体系的自组装

研究论文 | 更新时间：2021-03-19

- 掩膜诱导的光敏性三组分聚合物混合体系的自组装
- Self-assembly of Photosensitive Ternary Blend Directed by Mask
- 高分子学报 2017年第5期页码：768-775
- 作者机构：
  
  1.山西师范大学化学与材料科学学院临汾 041004
  2.山西师范大学物理与信息工程学院临汾 041004
- 作者简介：
  
  潘俊星, E-mail:panjunxing2007@163.com Jun-xing Pan, E-mail:panjunxing2007@163.com
  张进军, E-mail:zhangjinjun@sxnu.edu.cn Jin-jun Zhang, E-mail:zhangjinjun@sxnu.edu.cn
- 基金信息：
  
  国家自然科学基金(21373131);国家自然科学基金(11605108);山西省自然科学基金(2015011004);山西省研究生教育创新项目(2016BY094);山西省高等学校科技创新项目(WL2015KJCX-SJ-03)
- DOI：10.11777/j.issn1000-3304.2017.16270
  中图分类号：
- 纸质出版日期：2017-5，
  
  收稿日期：2016-9-3，
  
  修回日期：2016-10-11，
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李志海, 潘俊星, 张进军, 孙敏娜, 郭宇琦, 岑建勇, 武海顺. 掩膜诱导的光敏性三组分聚合物混合体系的自组装[J]. 高分子学报, 2017,(5):768-775.

Zhi-hai Li, Jun-xing Pan, Jin-jun Zhang, Min-na Sun, Yu-qi Guo, Jian-yong Cen, Hai-shun Wu. Self-assembly of Photosensitive Ternary Blend Directed by Mask[J]. Acta Polymerica Sinica, 2017,(5):768-775.
李志海, 潘俊星, 张进军, 孙敏娜, 郭宇琦, 岑建勇, 武海顺. 掩膜诱导的光敏性三组分聚合物混合体系的自组装[J]. 高分子学报, 2017,(5):768-775. DOI： 10.11777/j.issn1000-3304.2017.16270.

Zhi-hai Li, Jun-xing Pan, Jin-jun Zhang, Min-na Sun, Yu-qi Guo, Jian-yong Cen, Hai-shun Wu. Self-assembly of Photosensitive Ternary Blend Directed by Mask[J]. Acta Polymerica Sinica, 2017,(5):768-775. DOI： 10.11777/j.issn1000-3304.2017.16270.

摘要

采用含时金兹堡-朗道理论（time-dependent Ginzburg-Landau theory）研究了二维体系中光敏性三组分聚合物混合体系在掩膜诱导下的相行为.详细探讨了光化学反应速率、聚合物组分比和掩膜长宽比对相分离行为的影响.获得了不同条件下体系形貌结构的相图，通过对这些相图的分析得到了岛状、网络状、层状等有序结构形成的条件.研究表明，固定掩膜的长宽比（

：

=6：4），当C组分的浓度

0.35和光化学反应速率

1×10

-5

时，体系形成岛状结构；当

0.4和

1×10

-5

时，体系主要形成层状和网状结构.固定光化学反应速率（

=1×10

-3

），当6：5≤

：

≤ 6：1和

0.35时，体系形成岛状结构；当6：6≤

：

≤ 6：1和

0.4时，体系主要形成层状和网状结构.固定C组分的浓度（

=0.45），当

≥ 5×10

-4

和6：6≤

：

≤ 6：1时，体系主要形成层状和网状结构.稳定性分析表明这些有序结构在去掉掩膜之后仍能稳定存在.

Abstract

The phase behavior of a ternary blend with photochemical reaction induced by a mask are investigated

via

the Time-Dependent Ginzburg-Landau theory. The effects of the composition ratio

the length-width ratio of the photomask

and thephotoreaction rate coefficient on the domain structure and formation are systematically investigated. Through analysis of the phase diagram

the conditions for the formation of the ordered structures

such as island-like

network-like

and lamellar structures

are obtained. When the photoreaction rate coefficient

is not larger than 1×10

-5

the system forms a disordered structure

regardless of the strong variations in the C component concentration and the length-width ratio of the photomask. Firstly

when the length-width ratio of the photomask is fixed (

=6:4)

with increasing the photochemical reaction rate

the disordered morphology transforms to island-like structure when

0.35; it forms disordered structure again when 0.35 ≤

≤ 0.4; a transition of disordered strcture-lamellar strcture-network structure occurs in the system when

0.4. Secondly

when the photoreaction rate coefficient is fixed (

=1×10

-3

)

with increasing C component concentration

the system shows a multiple morphology transition of island-like-disordered-lamellar-network when 6:4 ≤

≤ 6:1; when 6:6 ≤

6:4

the island-like structure changes to disordered and then to network structure. Finally

when the C component concentration is fixed (

=0.45)

with the decrease in the length-width ratio of the photomask

the morphology transforms from disordered to lamellar

and then to network when 1×10

-5

5×10

-4

; when 5×10

-4

≤

1×10

-2

the lamellar structure turns to network structure; and when

≥ 1×10

-2

the photochemical reaction rate is so fast that the A/B blend does not undergo the phase separation

and the macro-morphology transforms from lamellar to network. In addition

to gain insight into the stability of the structures obtained

a linear stability analysis is also carried out. The results show that these ordered structures can still be stable after the removal of the mask.

关键词

自组装光化学反应聚合物混合物掩膜

Keywords

Self-assemblyPhotochemical reactionPolymer mixtureMask

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