聚乙烯吡咯烷酮杂化双色光敏激光直写光刻胶研究

曹春; 邱毅伟; 刘建亭; 朱大钊; 丁晨良; 杨臻垚; 匡翠方; 刘旭

doi:10.11777/j.issn1000-3304.2021.21323

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聚乙烯吡咯烷酮杂化双色光敏激光直写光刻胶研究

研究论文 | 更新时间：2024-10-08

- 聚乙烯吡咯烷酮杂化双色光敏激光直写光刻胶研究
- Polyvinylpyrrolidone Hybrid Photoresist for Two-color Sensitive Direct Laser Writing
- 高分子学报 2022年53卷第6期页码：608-616
- 作者机构：
  
  1.之江实验室交叉创新研究院智能芯片与器件研究中心杭州 311121
  2.中国科学院化学研究所绿色印刷重点实验室北京分子科学国家研究中心北京 100190
  3.浙江大学光电科学与工程学院杭州 310027
- 作者简介：
  
  E-mail: caochun@iccas.ac.cn;
  E-mail:cfkuang@zju.edu.cn
- 基金信息：
  
  国家自然科学基金(基金号 22105180);中国博士后科学基金(基金号 2020M681956);之江实验室重大科学项目(2020MC0AE01)
- DOI：10.11777/j.issn1000-3304.2021.21323
  中图分类号：
- 纸质出版日期：2022-06-20，
  
  网络出版日期：2022-01-14，
  
  收稿日期：2021-10-28，
  
  录用日期：2021-12-14
- 稿件说明：
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曹春,邱毅伟,刘建亭等.聚乙烯吡咯烷酮杂化双色光敏激光直写光刻胶研究[J].高分子学报,2022,53(06):608-616.

Cao Chun,Qiu Yi-wei,Liu Jian-ting,et al.Polyvinylpyrrolidone Hybrid Photoresist for Two-color Sensitive Direct Laser Writing[J].ACTA POLYMERICA SINICA,2022,53(06):608-616.
曹春,邱毅伟,刘建亭等.聚乙烯吡咯烷酮杂化双色光敏激光直写光刻胶研究[J].高分子学报,2022,53(06):608-616. DOI： 10.11777/j.issn1000-3304.2021.21323.

Cao Chun,Qiu Yi-wei,Liu Jian-ting,et al.Polyvinylpyrrolidone Hybrid Photoresist for Two-color Sensitive Direct Laser Writing[J].ACTA POLYMERICA SINICA,2022,53(06):608-616. DOI： 10.11777/j.issn1000-3304.2021.21323.

摘要

有机高分子光刻胶是双色光敏激光直写技术实现微纳制造的介质和载体，直接影响了其所制造微纳结构的精度、真实度等性能. 采用聚乙烯吡咯烷酮(PVP)作为杂化组分，引入到季戊四醇三丙烯酸酯(PETA)活性单体中，以调控光刻胶的黏度、力学强度、体积收缩率和聚合反应速度等. 结果表明，PVP与PETA存在氢键相互作用，可作为交联位点，提高光刻胶的交联度. 同时，PVP的引入使得体系黏度增加，可降低氧阻聚效应，有效地提升了光刻胶中PETA的光聚合单体转化率(30.1%)，获得了更高的灵敏度和更低聚合阈值(6.5 mW，20 wt% PVP). 此外，PVP的引入还使得光刻胶的体积收缩率由18%降为3%，大幅减少了所制造结构的内应力，改善了光刻精度和微纳结构的真实度. 最终，由PVP杂化光刻胶加工的线条精度高达48 nm，且比无PVP光刻胶具有更高的均匀性和规整度. 本研究对高精度及高质量微纳制造和多种应用都具有重要的意义.

Abstract

Organic-polymer photoresist is the medium and carrier of micro manufacturing by two-color sensitive direct laser writing technology

which directly affects the accuracy and authenticity of the micro structures. In this work

polyvinylpyrrolidone (PVP) is introduced into pentaerythritol triacrylate (PETA) to control the viscosity

mechanical strength

volume shrinkage and polymerization rate of photoresist. The results show that hydrogen bond is formed between PVP and PETA

which can be used as a crosslinking site to improve the crosslinking degree of photoresist. Meanwhile

the introduction of PVP also increases the viscosity of the system

reduces the oxygen inhibition

and finally effectively improves the photo-polymerization conversion rate (30.1%) of PETA in photoresist

obtaining higher sensitivity and lower polymerization threshold (6.5 mW

20 wt% PVP). In addition

the PVP sharply reduces the volume shrinkage of photoresist from 18% to 3%

greatly weakening the internal stress of the fabricated structure

thus improving the lithography performance of micro structures. Finally

the minimum linewidth of PVP composited photoresist can reach 48 nm

which has higher uniformity and regularity than that of photoresist without PVP. Thus

this work is of great significance for high-precision and high-quality micro manufacturing and various applications.

关键词

聚乙烯吡咯烷酮光刻胶双色光敏激光直写

Keywords

PolyvinylpyrrolidonePhotoresistTwo-color sensitiveDirect laser writing

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